000 00676nac a22002171u 4500
010 _a011006358
020 _a0123496705
082 _a671.735
_bHIT
090 _c7415
_d7415
100 _aHitchman, Michael L.
245 _aChemical vapor deposition /
_cedited by Michael L. Hitchman and Klavs F. Jensen.
260 _aLondon:
_bAcademic Press,c.1993.
_cc.1993.
300 _av,677p. ;
_c21cm.
500 _aDistributer: Al-Ahram.
511 _aCatalogued By: Mahitab.
650 _aChemical vapor deposition.
650 _aPlating .
700 _aHitchman, Michael L.
700 _aJensen, Klavs F.
942 _cBB
_k671.735 HIT
999 _c7415
_d7415